Journal of Applied Sciences, ( ISI ), Volume (9), No (7), Year (2009-7) , Pages (1285-1292)

Title : ( Comprehensive analysis of a high-Q, low motional resistance, very-high frequency MEMS resonator )

Authors: - - , Sayyed-Hossein Keshmiri ,

Citation: BibTeX | EndNote

Abstract

In this paper, design and simulation of an IC-compatible microelectromechanical resonator for use in VHF range of a wireless communication system as a base element in integrated micromechanical resonator based oscillators and front-end filters is reported. This resonator can be implemented using thick polysilicon technology. The resonator with new design and structure reduces vibrating micromechanical series motional resistance Rx by increasing electrode-to-resonator overlap area through use of scale up of the motionless dimension of the device; while maintaining the resonant frequency. Quarter-wavelength supporting and attaching to nodal points of the resonator is required to maximize quality factor of the device. Resonant frequencies around 71 MHz, quality factor of 9912, spurious-free dynamic ranges around 92 dB and motional resistances Rx on the order of 480  were obtained by this design.

Keywords

, Micromechanical Resonator, Motional Resistance, Quality Factor, MEMS
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@article{paperid:1012542,
author = { -, - and Keshmiri, Sayyed-Hossein},
title = {Comprehensive analysis of a high-Q, low motional resistance, very-high frequency MEMS resonator},
journal = {Journal of Applied Sciences},
year = {2009},
volume = {9},
number = {7},
month = {July},
issn = {1812-5654},
pages = {1285--1292},
numpages = {7},
keywords = {Micromechanical Resonator; Motional Resistance; Quality Factor; MEMS},
}

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%0 Journal Article
%T Comprehensive analysis of a high-Q, low motional resistance, very-high frequency MEMS resonator
%A -, -
%A Keshmiri, Sayyed-Hossein
%J Journal of Applied Sciences
%@ 1812-5654
%D 2009

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