Title : ( Resonant wideband polarizer with single silicon layer )
Authors: K. J. Lee , J. Curzan , Mehrdad Shokooh-Saremi , R. Magnusson ,
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Abstract
We present the design, fabrication, and characterization of a guided-mode resonance polarizer operating in the telecommunication band. This polarizer consists of a single one-dimensional silicon grating layer and a glass substrate. The device is designed using inverse mathematical methods and fabricated by thin-film deposition, holographic-interference patterning, and etching. The fabricated polarizer has high transmittance for transverse-magnetic polarization and low transmittance for transverse-electric polarization over a 200 nm wavelength range. Its experimental extinction ratio is 670:1 at a central wavelength c=1563 nm. Experimental and theoretical results are in good agreement.
Keywords
, diffraction gratings, etching, holography, inverse problems, light polarisation, microwave photonics, monolayers, optical design techniques, optical fabrication, optical polarisers, silicon
@article{paperid:1024463,
author = {K. J. Lee and J. Curzan and Shokooh-Saremi, Mehrdad and R. Magnusson},
title = {Resonant wideband polarizer with single silicon layer},
journal = {Applied Physics Letters},
year = {2011},
volume = {98},
number = {21},
month = {May},
issn = {0003-6951},
pages = {211112--2111123},
numpages = {1900011},
keywords = {diffraction gratings; etching; holography; inverse problems; light polarisation; microwave photonics; monolayers; optical design techniques; optical fabrication; optical polarisers; silicon},
}
%0 Journal Article
%T Resonant wideband polarizer with single silicon layer
%A K. J. Lee
%A J. Curzan
%A Shokooh-Saremi, Mehrdad
%A R. Magnusson
%J Applied Physics Letters
%@ 0003-6951
%D 2011
